METHOD FOR APPLYING A RESIST LAYER, USES OF ADHESIVE MATERIALS, AND ADHESIVE MATERIALS AND A RESIST LAYER

摘要

The invention relates to a method wherein a resist layer (12) is applied to a base layer (24). The resist layer (12) is made of an adhesive material, the adhesive force thereof either reducing or increasing during radiation. Removal of residue of the resist layer (12) is made easier due to said method.