| 摘要 |
PROBLEM TO BE SOLVED: To reduce the number of production steps of a water-repellent structure with fine rugged shape. SOLUTION: A film for forming columnar projections consisting of SiO<SB>2</SB>is formed on the upper face of a base material 1. Next, many particles 4 consisting of Al<SB>2</SB>O<SB>3</SB>are formed on the upper face of the film for forming columnar projections at random by a vapor deposition method. Namely, in the case the film thickness of Al<SB>2</SB>O<SB>3</SB>formed on the upper face of the film for forming columnar projections by a vapor deposition method is controlled to 50 to 100Å, a film of Al<SB>2</SB>O<SB>3</SB>is not formed, but insular many particles 4 consisting of Al<SB>2</SB>O<SB>3</SB>are formed at random. Then, with the particles 4 as masks, the film for forming columnar projections is half-etched, so that columnar projections 3 are formed below the particles 4, and further, a columnar projection supporting layer 2 supporting the columnar projections 3 is formed. Next, a water-repellent film 5 is formed on the surface of the columnar projection supporting layer 2 including the particles 4 and the columnar projections 3. In this case, the particles 4 serving as the masks are formed of Al<SB>2</SB>O<SB>3</SB>like a island by a vapor deposition method, so that the number of production steps can be reduced compared with the case by a photolithography method. COPYRIGHT: (C)2005,JPO&NCIPI
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