发明名称 Method for forming film
摘要 A method for easily and uniformly forming a film at a low cost, which is comprising a diffusion-barrier layer 3 and a coating layer 4, on a surface of a substrate 1. The method has a preliminary oxidation step of forming a substrate oxide layer 2 by oxidizing the substrate 1, and a step of coating the surface thereof with a coating material containing at least one alloy or a compound, which includes an element forming an oxide having a low enthalpy of formation as compared to that of the oxide of the substrate oxide layer 2, and as a result.
申请公布号 US2005074561(A1) 申请公布日期 2005.04.07
申请号 US20040765831 申请日期 2004.01.29
申请人 NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY 发明人 TABARU TATSUO;SHOBU KAZUHISA;HIRAI HISATOSHI;SAKAMOTO MICHIRU
分类号 C23C4/02;C23C8/80;C23C28/00;(IPC1-7):B05D1/08 主分类号 C23C4/02
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