发明名称 Absorber layer for DSA processing
摘要 A method of processing a substrate comprising depositing a layer comprising amorphous carbon on the substrate and then laser annealing the substrate is provided. Optionally, the layer further comprises a dopant selected from the group consisting of nitrogen, boron, phosphorus, fluorine, and combinations thereof. In one aspect, the layer comprising amorphous carbon is an anti-reflective coating and an absorber layer that absorbs electromagnetic radiation emitted by the laser and anneals a top surface layer of the substrate.
申请公布号 US2005074956(A1) 申请公布日期 2005.04.07
申请号 US20030679189 申请日期 2003.10.03
申请人 APPLIED MATERIALS, INC. 发明人 AUTRYVE LUC VAN;BENCHER CHRIS D.;JENNINGS DEAN;LIANG HAIFAN;MAYUR ABHILASH J.;YAM MARK;YEH WENDY H.;BROUGH RICHARD A.
分类号 H01L21/027;H01L21/265;H01L21/268;H01L21/314;H01L21/324;(IPC1-7):H01L21/425;H01L21/26;H01L21/31;H01L21/42;H01L21/469;H01L21/477 主分类号 H01L21/027
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