| 摘要 |
Apparatuses and methods for processing semiconductor wafers. In one embodiment, an apparatus includes an immersion processing tank in which one or more wafers are positioned in a processing liquid during a treatment, at least one sound source that is acoustically coupled to the processing liquid and that produces a sound field in the processing liquid contained in the processing tank during a treatment, and a sound diffusing system comprising a plurality of sound diffusing elements positioned in a manner effective to diffuse sound energy transferred from the source to the processing liquid. In another embodiment, the sound diffusing system includes at least one directionally phase modulating element positioned in a manner effective to reduce interference of sound energy in the processing liquid. Related methods are also described.
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