| 摘要 |
PROBLEM TO BE SOLVED: To provide an aligner capable of smoothly performing exposure processing while maintaining high exposure accuracy by suppressing the upsizing of the device in spite of the upsizing of a substrate which is an object for exposure processing. SOLUTION: The exposing device EX is equipped with a first exposure station ST 1 and a second exposure station ST 2 capable of exposing a photosensitive substrate P and a control system CONT for controlling the exposure in such a manner that after the first exposure is performed in the first exposure station ST 1, the photosensitive substrate P undergoing the first exposure is continuously subjected to second exposure at the second exposure station ST 2. COPYRIGHT: (C)2005,JPO&NCIPI |
