THERMAL TREATMENT EQUIPMENT, THERMAL TREATMENT METHOD, AND SUBSTRATE TREATING DEVICE

摘要

PROBLEM TO BE SOLVED: To provide thermal treatment equipment, a thermal treatment method, and a substrate treating device by which the heat accumulation in the holding section of a substrate transporting means can be suppressed with a simple structure without lowering the throughput of substrate treatment. SOLUTION: In a thermal treatment unit PHP, a substrate W is transported between a receiving/delivering section 201 and a heating section 202 in a state where the substrate W is held by a local transport hand RHR and the substrate W is heat-treated by means of the heating section 202. In addition, the local transport hand RHR is cooled by means of the cooling plate 250 of the receiving/delivering section 201. COPYRIGHT: (C)2005,JPO&NCIPI