发明名称 Deposition apparatus, deposition method, optical element, and optical system
摘要 A deposition apparatus generates plasma by applying voltage to a target, deposits target's particles that are vaporized by the plasma onto a surface of an object, and forms a thin film onto the surface of the object, and also includes a plasma direction unit that directs the plasma generated by the application of the voltage.
申请公布号 US2005072669(A1) 申请公布日期 2005.04.07
申请号 US20040953931 申请日期 2004.09.29
申请人 TERANISHI KOJI;SUZUKI YASUYUKI 发明人 TERANISHI KOJI;SUZUKI YASUYUKI
分类号 G02B1/11;C23C14/00;C23C14/06;C23C14/34;H01J37/32;(IPC1-7):G02B25/00 主分类号 G02B1/11
代理机构 代理人
主权项
地址