发明名称 |
Deposition apparatus, deposition method, optical element, and optical system |
摘要 |
A deposition apparatus generates plasma by applying voltage to a target, deposits target's particles that are vaporized by the plasma onto a surface of an object, and forms a thin film onto the surface of the object, and also includes a plasma direction unit that directs the plasma generated by the application of the voltage.
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申请公布号 |
US2005072669(A1) |
申请公布日期 |
2005.04.07 |
申请号 |
US20040953931 |
申请日期 |
2004.09.29 |
申请人 |
TERANISHI KOJI;SUZUKI YASUYUKI |
发明人 |
TERANISHI KOJI;SUZUKI YASUYUKI |
分类号 |
G02B1/11;C23C14/00;C23C14/06;C23C14/34;H01J37/32;(IPC1-7):G02B25/00 |
主分类号 |
G02B1/11 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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