发明名称 |
Antireflection structure |
摘要 |
An antireflection structure (10) comprises a base (1), and a finely roughened antireflection part (2) formed in a surface of the base (1). The finely roughened antireflection part (2) includes a plurality of projections and depressions defined by the projections. The projections are distributed such that PMAX<=LAMBDAMIN, where PMAX is the biggest one of distances between tips (2t) of the adjacent projections and lambdaMIN is the shortest one of wavelengths of visible light rays in a vacuum. The sectional area of each projection in a plane parallel to the surface of the base (1) increases continuously from the tip (2t) toward the bottom (2b) of the depression adjacent to the projection. The shape (2Mt) of a tip part (Mt) of each projection in a plane perpendicular to the surface of the base (1) is sharper than the shape (2Mb) of a bottom part (Mb) of each depression in the same plane vertical to the surface of the base (1).
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申请公布号 |
US2005074579(A1) |
申请公布日期 |
2005.04.07 |
申请号 |
US20030368494 |
申请日期 |
2003.02.20 |
申请人 |
DAI NIPPON PRINTING CO., LTD. |
发明人 |
SUZUKI TOSHIYUKI;ITO ARIMICHI;TOYAMA NOBUHITO |
分类号 |
G02B5/02;B29C59/02;G02B1/11;G02F1/1335;(IPC1-7):B32B1/00 |
主分类号 |
G02B5/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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