发明名称 Antireflection structure
摘要 An antireflection structure (10) comprises a base (1), and a finely roughened antireflection part (2) formed in a surface of the base (1). The finely roughened antireflection part (2) includes a plurality of projections and depressions defined by the projections. The projections are distributed such that PMAX<=LAMBDAMIN, where PMAX is the biggest one of distances between tips (2t) of the adjacent projections and lambdaMIN is the shortest one of wavelengths of visible light rays in a vacuum. The sectional area of each projection in a plane parallel to the surface of the base (1) increases continuously from the tip (2t) toward the bottom (2b) of the depression adjacent to the projection. The shape (2Mt) of a tip part (Mt) of each projection in a plane perpendicular to the surface of the base (1) is sharper than the shape (2Mb) of a bottom part (Mb) of each depression in the same plane vertical to the surface of the base (1).
申请公布号 US2005074579(A1) 申请公布日期 2005.04.07
申请号 US20030368494 申请日期 2003.02.20
申请人 DAI NIPPON PRINTING CO., LTD. 发明人 SUZUKI TOSHIYUKI;ITO ARIMICHI;TOYAMA NOBUHITO
分类号 G02B5/02;B29C59/02;G02B1/11;G02F1/1335;(IPC1-7):B32B1/00 主分类号 G02B5/02
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