摘要 |
<p>A substrate(20) is covered with a structure influencing layer(40) and a further, preferably functional, layer(52,53) is applied onto the latter. Adhesion between the substrate and the structure altering layer(40) is enhanced by initial application of a coupling layer(30) onto the substrate(20). The vacuum deposition process can be either a physical vapor deposition(PVD) and/or a chemical vapor deposition(CVD) process, in particular a plasma enhanced chemical vapor deposition(PECVD) and more particularly a plasma impulse chemical vapor deposition(PIVCD). Substrates are pre-treated in an oxygen containing plasma. Precursor concentration in the process gas is 1-20, preferably 2-10 and more preferably 4-8vol%. Thickness of the structure influencing layer is not less than5nm, preferably 5-200nm and more preferably 20-70nm. Functional layers(52,53) can incorporate a scratch resistant layer and/or an anti-reflective layer and/or an easy clean layer. Independent claims are included for: a) a composite material produced by the claimed process and incorporating a structure influencing layer; b) a composite material comprising a plastic substrate, an adhesion coupling layer and a functional layer(52,53) with a structure influencing layer on the substrate facing side; c) a housing for telecommunication equipment and/or instruments and/or headlamps comprising the composite material, d) a component, particularly a high quality optical component comprising the composite material; e) a spectacle lens comprising the composite material.</p> |