发明名称 |
METHOD OF FORMING THIN FILM PATTERN, ELECTROOPTIC DEVICE, AND ELECTRONIC EQUIPMENT |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method of forming thin film pattern by which a time required for forming a thin film pattern can be shortened, and in addition, the thin film pattern can be formed inexpensively. <P>SOLUTION: The method of forming the thin film pattern by arranging a functional fluid on a substrate includes a fluid repelling step of imparting a liquid repelling property to the substrate; a lyophilic pattern forming step of forming a lyophilic section on the substrate by projecting ultraviolet rays upon the substrate after a metallic mask having the same opening pattern as that of the thin film pattern is arranged on the substrate imparted with the liquid repelling property; and a material arranging step of arranging the functional fluid in the lyophilic section by a droplet discharging method. It is also possible to perform O<SB>2</SB>plasma treatment instead of projecting the ultraviolet rays. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
申请公布号 |
JP2005093691(A) |
申请公布日期 |
2005.04.07 |
申请号 |
JP20030324627 |
申请日期 |
2003.09.17 |
申请人 |
SEIKO EPSON CORP |
发明人 |
MIKOSHIBA TOSHIAKI |
分类号 |
G02B5/20;G02F1/1343;G09F9/00;H01B13/00;H01L21/288;H01L21/3205;H01L51/50;H05B33/10;H05B33/14;(IPC1-7):H01L21/288;G02F1/134;H01L21/320 |
主分类号 |
G02B5/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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