发明名称 Capacitor having low resistance electrode including a thin silicon layer
摘要 A capacitor is provided having a first electrode including a layer of low-resistance non-silicon material. The capacitor includes a layer of silicon formed on the low-resistance material layer and a capacitor dielectric formed on the layer of silicon. A second electrode is formed on the capacitor dielectric, the second electrode including at least a material selected from the group consisting of metals, low-resistance compounds of metals, and deposited semiconductors having a dopant concentration of at least 1x10<17>cm<-3>.
申请公布号 US2005073801(A1) 申请公布日期 2005.04.07
申请号 US20040922435 申请日期 2004.08.20
申请人 TESSERA, INC. 发明人 HAWE FRANCIS EDWARD;THIPPHAVONG VISITH
分类号 H01L21/02;H01L21/8244;(IPC1-7):H01L21/824 主分类号 H01L21/02
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