发明名称 Semiconductor device and driving circuit for semiconductor device
摘要 A PMOS transistor (Q2) provided for developing a short circuit between the base and emitter of an N-type IGBT during turn-OFF includes a P diffusion region (5), a P diffusion region (6), and a conductive film (10) and a second gate electrode (15) provided via a gate oxide film (21) on a surface of an N<-> epitaxial layer (2) between the P diffusion regions (5 and 6). The gate oxide film (21) is formed in a thickness having a gate breakdown voltage higher than the element breakdown voltage of a typical field oxide film and the like.
申请公布号 US2005072990(A1) 申请公布日期 2005.04.07
申请号 US20040866677 申请日期 2004.06.15
申请人 MITSUBISHI DENKI KABUSHIKI KAISHA 发明人 TERASHIMA TOMOHIDE
分类号 H01L29/70;H01L21/8238;H01L21/8249;H01L27/06;H01L27/092;H01L29/73;H01L29/739;H03K17/04;(IPC1-7):H01L29/80 主分类号 H01L29/70
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