| 摘要 |
In a method for the manufacture of an active matrix for an electro-optical display device, the active zone exposure fields CH1, CH2 are obtained by the transfer of an active zone mask in such a way that there is a non-null overlap zone zl, zr, zt, zb between two successive exposure fields. The active zone mask is exposed a first time. This mask is positioned for the next exposure so as to overlap the first exposed field on a certain width F1, F2. In the overlap zones, an exposure of the mask provides only a part of the patterns.
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