PROJECTION EXPOSURE DEVICE, PROJECTION EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD

摘要

A projection exposure device transfers a pattern formed on a mask R onto a substrate W via a projection optical system PL. The projection exposure device includes electricity removal devices (40-46) for removing electricity from a liquid (7) supplied to a portion between the projection optical system PL and the surface of its substrate W. This prevents destruction of the circuit pattern or malfunction of the device caused by charging of the liquid.