| 摘要 |
<p>A method and apparatus for controlling a power supply (30) to prevent instabilities due to dynamic loads in RF plasma processing systems, operating at frequencies of from 1 MHz and up, uses a feedforward type of control loop (53) to tightly regulate the power supplied to the dynamic electrical load (40), such as loads caused by variable and inconsistent plasma impedance. A feedback control loop (53) can also be used in combination with the feedforward loop (53), but at a slower rate, to help regulate the amount of power provided to the load (40).</p> |
