| 摘要 |
PROBLEM TO BE SOLVED: To provide an electron flood apparatus capable of discharging electrons with low energy and being maintained with mitigated burden, and an ion implanter having it. SOLUTION: An electron flood apparatus 1 according to the present invention includes a chamber 22 having a first portion 22 consisting of conductor and a second portion 22b consisting of insulative material and extending along a predetermined closed contour Ax. A coil 18 is provided out of the first portion 22a to produce a magnetic field intersecting with a plane formed by the predetermined closed contour Ax. The coil 18 and the chamber 22 are inductively coupled by this magnetic field. As plasma of inert gas is produced in the chamber 22 mainly by inductive coupling, electrons in the plasma has low energy. At this point, electrons having low energy are discharged from an opening 14 by applying a voltage to an electrode 21. COPYRIGHT: (C)2005,JPO&NCIPI
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