发明名称 |
Composite optical lithography method for patterning lines of significantly different widths |
摘要 |
A composite patterning technique may include three lithography processes. A first lithography process forms a periodic pattern of alternating continuous lines of substantially equal width and spaces on a first photoresist. A second lithography process uses a non-interference lithography technique to break continuity of the patterned lines and form portions of desired integrated circuit features. The first photoresist may be developed. A second photoresist is formed over the first photoresist. A third lithography process uses a non-interference lithography technique to expose a pattern on the second photoresist and form remaining desired features of an integrated circuit pattern.
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申请公布号 |
US2005074698(A1) |
申请公布日期 |
2005.04.07 |
申请号 |
US20030681030 |
申请日期 |
2003.10.07 |
申请人 |
INTEL CORPORATION |
发明人 |
BORODOVSKY YAN |
分类号 |
G03F7/20;(IPC1-7):G03F9/00;G03B27/00 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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