发明名称 BASIC MATERIAL FOR PATTERNING AND PATTERNING METHOD
摘要 A patterning method in which a liquid drop is applied across a water repellent region and a hydrophilic line to satisfy the expression (1) when the water repellent region where the liquid drop has a first contact angle at the time of touching an objective plane before being ejected onto a substrate, and the hydrophilic line adjacent to the water repellent region and becoming a pattern to be formed where the liquid drop has a second contact angle smaller than the first contact angle are formed on the substrate. D<= Lx{1+2(cosTheta2- cosTheta1)}...(1) where, D: diameter of liquid drop, L: width of pattern, Theta1 : first contact angle, Theta2: second contact angle. Since the number of liquid drops being ejected is decreased, an increase in tact time and a decrease in ink jet lifetime can be prevented.
申请公布号 KR20050032615(A) 申请公布日期 2005.04.07
申请号 KR20057003222 申请日期 2005.02.25
申请人 SHARP CORPORATION 发明人 FUJII, AKIYOSHI;HONDA, MITSURU;NAKABAYASHI, TAKAYA
分类号 B41J2/01;B05D1/26;B41J2/14;B41J2/16;G02F1/1343;H01J9/02;H01L21/288;H01L29/786;H05K3/12;(IPC1-7):B41J2/01;H01L21/320;H05K3/10 主分类号 B41J2/01
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