发明名称 SUBSTRATE PROCESSING DEVICE AND METHOD FOR HOLDING SUBSTRATE IN THE SUBSTRATE PROCESSING DEVICE
摘要 PROBLEM TO BE SOLVED: To accurately position a substrate in a vacuum processing chamber in a substrate processing device for vacuum processing the substrate. SOLUTION: A substrate holder 5 having a hook 6 for holding a susceptor 11 for housing the substrate 10 and an elevator part 2 for holding the susceptor 11 carried in from an outside and moving the held susceptor 11 to the position of the hook 6 of the substrate holder 5 are provided in the vacuum processing chamber 200 of the substrate processing device having the vacuum processing chamber 200 for processing the substrate 10. And a fixing mechanism for fixing the susceptor 11 to the predetermined position of the hook 6 by bringing the susceptor 11 into contact with the hook 6 by rotating the hook 6 is provided to the substrate holder 5 when the elevating part 2 moves the susceptor 11 to the position of the hook 6. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005093789(A) 申请公布日期 2005.04.07
申请号 JP20030326142 申请日期 2003.09.18
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 UMEHARA SATOSHI;FUJISAWA TATSUYA;NAKAJIMA KATSUNORI;KONDO MASAKI
分类号 G03F9/00;H01L21/027;H01L21/302;H01L21/68;(IPC1-7):H01L21/68 主分类号 G03F9/00
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