发明名称 |
SUBSTRATE PROCESSING DEVICE AND METHOD FOR HOLDING SUBSTRATE IN THE SUBSTRATE PROCESSING DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To accurately position a substrate in a vacuum processing chamber in a substrate processing device for vacuum processing the substrate. SOLUTION: A substrate holder 5 having a hook 6 for holding a susceptor 11 for housing the substrate 10 and an elevator part 2 for holding the susceptor 11 carried in from an outside and moving the held susceptor 11 to the position of the hook 6 of the substrate holder 5 are provided in the vacuum processing chamber 200 of the substrate processing device having the vacuum processing chamber 200 for processing the substrate 10. And a fixing mechanism for fixing the susceptor 11 to the predetermined position of the hook 6 by bringing the susceptor 11 into contact with the hook 6 by rotating the hook 6 is provided to the substrate holder 5 when the elevating part 2 moves the susceptor 11 to the position of the hook 6. COPYRIGHT: (C)2005,JPO&NCIPI |
申请公布号 |
JP2005093789(A) |
申请公布日期 |
2005.04.07 |
申请号 |
JP20030326142 |
申请日期 |
2003.09.18 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORP |
发明人 |
UMEHARA SATOSHI;FUJISAWA TATSUYA;NAKAJIMA KATSUNORI;KONDO MASAKI |
分类号 |
G03F9/00;H01L21/027;H01L21/302;H01L21/68;(IPC1-7):H01L21/68 |
主分类号 |
G03F9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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