发明名称 AIR INLET OF DISPOSAL APPARATUS FOR POLLUTANT
摘要 <p><P>PROBLEM TO BE SOLVED: To provide an air inlet of a disposal apparatus for a process exhaust gas containing pollutants which are especially produced in manufacturing semiconductor parts capable of preventing from forming deposits at the air inlet of the disposal apparatus for the process exhaust gas. <P>SOLUTION: The air inlet of this invention is so designed that a porous gas permeation wall is provided at the air inlet so as to be capable of supplying an inactive gas to the inside of the air inlet which assigns a passage of process exhaust gas to avoid the formation of the deposits at the air inlet of the disposal apparatus for the process exhaust gas. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p>
申请公布号 JP2005088000(A) 申请公布日期 2005.04.07
申请号 JP20040266052 申请日期 2004.09.13
申请人 DAS-DUENNSCHICHT ANLAGEN SYSTEM GMBH 发明人 WIESENBERG WIDO;WIESENBERG RALPH;RITTER TILMANN;FRENZEL ANDREAS
分类号 B01D53/34;B01J4/00;F23G7/06;F23L7/00;(IPC1-7):B01D53/34 主分类号 B01D53/34
代理机构 代理人
主权项
地址