发明名称 PHOTOMASK, METHOD FOR MANUFACTURING PHOTOMASK, WIRING BOARD, COLOR FILTER, AND ELECTROOPTICAL EQUIPMENT
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a photomask which can easily and inexpensively be formed, a method for manufacturing the photomask, and a writing board using the photomask, a color filter, and electrooptical equipment . <P>SOLUTION: The photomask is provided with a light-transmissive flexible substrate 1 and a transfer layer 3 which is arranged on the flexible substrate 1 and contains sublimable coloring matter or thermal transition coloring matter, and a pattern 4 is formed on the transfer layer 3 according to the presence or absence of the sublimable coloring matter or thermal transition coloring matter is present. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p>
申请公布号 JP2005091849(A) 申请公布日期 2005.04.07
申请号 JP20030325939 申请日期 2003.09.18
申请人 SEIKO EPSON CORP 发明人 TOYODA NAOYUKI
分类号 G02B5/20;G03F1/00;G03F1/68;H01L21/027;(IPC1-7):G03F1/08 主分类号 G02B5/20
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