| 摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method for scales for photoelectric encoders capable of adapting to the diversification of the widths and intervals of a plurality of line patterns constituting optical gratings without having to create new masks. SOLUTION: After a resist pattern 33 is formed, the pattern 33 is thermally treated in the case of increasing its width, and the pattern 33 is irradiated with ultraviolet rays and then thermally treated in the case of reducing its width. The width of the resist pattern 33 is thereby adjusted correspondingly to the width of a line pattern of an optical grating. By selectively etching a chrome film 23 with the resist pattern 33 after adjustment as a mask, the optical grating is formed. COPYRIGHT: (C)2005,JPO&NCIPI |
