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经营范围
发明名称
Substrate holder and lithographic projection apparatus
摘要
申请公布号
EP1498780(A3)
申请公布日期
2005.04.06
申请号
EP20040077030
申请日期
2004.07.13
申请人
ASML NETHERLANDS B.V.
发明人
OTTENS, JOOST JEROEN;VAN EMPEL, TJARKO ADRIAAN RUDOLF;ZAAL, KOEN JACOBUS JOHANNES MARIA
分类号
G03F7/20;(IPC1-7):G03F7/20
主分类号
G03F7/20
代理机构
代理人
主权项
地址
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