发明名称 |
NITRIDE SEMICONDUCTOR LIGHT EMITTING DEVICE AND METHOD FOR MANUFACTURING THE SAME |
摘要 |
A GaN semiconductor light emitting device and a manufacturing method thereof are provided to improve the lifetime by reducing driving voltage of the device using a transparent electrode formed with a predetermined metal group. An N-doped nitride semiconductor layer(11), a light emissive layer(12) and a P-doped nitride semiconductor layer(13) are sequentially formed on a substrate(10). The N-doped nitride semiconductor layer is partially exposed to the outside by performing mesa etching on the resultant structure. A transparent electrode(30) is formed on the P-doped nitride semiconductor layer by using a predetermined metal group. At this time, the predetermined metal group is formed by mixing a first metal for generating metal oxide and a second metal for diffusing current with each other. A first and second pad electrode(15,16) are formed on the exposed N-doped nitride semiconductor layer and the transparent electrode, respectively. |
申请公布号 |
KR20050031720(A) |
申请公布日期 |
2005.04.06 |
申请号 |
KR20030067968 |
申请日期 |
2003.09.30 |
申请人 |
LG ELECTRONICS INC. |
发明人 |
CHOI, JAE WAN;HA, JUN SEOK;JANG, JUN HO |
分类号 |
H01L33/42;H01L33/38;(IPC1-7):H01L33/00 |
主分类号 |
H01L33/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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