PROCESS FOR DEPOSITING INSULATING FILM ON SUBSTRATE AT LOW TEMPERATURE,申请号KR20020022640-传众专利搜索

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发明名称	PROCESS FOR DEPOSITING INSULATING FILM ON SUBSTRATE AT LOW TEMPERATURE
摘要
申请公布号	KR100480500(B1)	申请公布日期	2005.04.06
申请号	KR20020022640	申请日期	2002.04.25
申请人		发明人
分类号	C23C16/448;H01L21/768;C23C16/40;C23C16/44;C23C16/455;H01L21/316;H01L23/522;(IPC1-7):C23C16/448	主分类号	C23C16/448
代理机构		代理人
主权项
地址

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