POSITIVE PHOTORESIST COMPOSITION FOR DISCHARGE NOZZLE-COATING METHOD AND FORMATION METHOD OF RESIST PATTERN

摘要

Provided is a positive photoresist composition containing particular surface active agent useful for preventing striped pattern scars while restricting amount of resist to be coated when the composition is applied on a substrate through discharge-nozzle. The photoresist composition comprises (A) alkali-soluble novolac resin, (C) naphthoquinone diazide group containing compound, (D) organic solvent and (E) surface active agent component having 10-25 wt.% of fluorine and 3-10 wt.% of silicon. The composition further includes (B) phenol hydroxy group containing compound having 1000 or less of molecular weight. The discharge-nozzle coating method comprises moving the discharge nozzle and a substrate relative to each other to paint overall area of the substrate. The (a) component has a mass average molecular weight Mw of at least 6000 in terms of polystyrene.