| 摘要 |
The method of forming the mask (1) involves processing or generating a coating of organic material on at least part of the mask using an electron beam. In the preferred process, the mask is placed in a chamber with a gaseous organic compound. A coating is derived from the gaseous material. An electron beam is directed onto the coating. The coating is broken up by the beam to form a diffusion. Independent claims also cover an apparatus for carrying out the method. |
