Substrate provided with an alignment mark, method of designing a mask, computer program, mask for exposing said mark, device manufacturing method, and device manufactured thereby

摘要

A substrate provided with an alignment mark in a substantially transmissive process layer overlying the substrate, said mark comprising at least one relatively high reflectance area(s) for reflecting radiation of an alignment beam of radiation, and relatively low reflectance areas for reflecting less radiation of the alignment beam, wherein the high reflectance area(s) is (are) segmented in first and second directions both directions being substantially perpendicular with respect to each other so that the high reflectance areas comprise predominantly rectangular segments.