发明名称 Composite dielectric layers
摘要 An apparatus including a contact point formed on a device layer of a circuit substrate or interconnect layer on a substrate; a first dielectric layer including cubic boron nitride on the substrate; and a different second dielectric layer on the substrate and separated from the device layer by the first dielectric layer. Also, an apparatus including a circuit substrate including a device layer and a composite dielectric layer. The composite dielectric includes a first dielectric material including cubic boron nitride and a different second dielectric material. The first dielectric material surrounds the second dielectric material.
申请公布号 US6876081(B2) 申请公布日期 2005.04.05
申请号 US20030659068 申请日期 2003.09.08
申请人 INTEL CORPORATION 发明人 CHOW LOREN A.
分类号 H01L21/318;H01L21/768;H01L23/532;(IPC1-7):H01L23/48 主分类号 H01L21/318
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