METHOD FOR CLEANING SEMICONDUCTOR WAFER TO ELIMINATE NECESSITY OF CLEANING PROCESS USING DEIONIZED WATER AND MAXIMIZE CLEANING EFFECT,申请号KR19970075748-传众专利搜索

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发明名称	METHOD FOR CLEANING SEMICONDUCTOR WAFER TO ELIMINATE NECESSITY OF CLEANING PROCESS USING DEIONIZED WATER AND MAXIMIZE CLEANING EFFECT
摘要
申请公布号	KR100483037(B1)	申请公布日期	2005.04.04
申请号	KR19970075748	申请日期	1997.12.27
申请人	HYNIX SEMICONDUCTOR INC.	发明人	LIM, SEONG AE
分类号	H01L21/304;(IPC1-7):H01L21/304	主分类号	H01L21/304
代理机构		代理人
主权项
地址

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