发明名称 |
CONTROLLING METHOD, TEMPERATURE CONTROLLING METHOD, THERMOREGULATOR, AND THERMAL TREATING EQUIPMENT |
摘要 |
PROBLEM TO BE SOLVED: To suppress scattering of physical condition, such as temperature or the like at transience. SOLUTION: The controlling method suppresses scattering of temperature of a heat treating board at time of t, using interference by this pre-heating, in such a manner that the pre-heating is executed by adding step input into a target temperature before a semiconductor wafer has been mounted, in order to suppress scattering of the temperature of the heat treating board at time t, after heat treatment has been started by mounting the semiconductor wafer on the heat treatment board. COPYRIGHT: (C)2005,JPO&NCIPI
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申请公布号 |
JP2005085075(A) |
申请公布日期 |
2005.03.31 |
申请号 |
JP20030317950 |
申请日期 |
2003.09.10 |
申请人 |
OMRON CORP |
发明人 |
KISHIMOTO TAKESHI;MINAMINO IKUO;TANAKA MASAHITO;TANAKA HITOSHI;ANDO KOSAKU |
分类号 |
H05B3/00;G05B11/32;G05D23/19;H01L21/324;(IPC1-7):G05D23/19 |
主分类号 |
H05B3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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