发明名称 Nonvolatile memory cell employing a plurality of dielectric nanoclusters and method of fabricating the same
摘要 A nonvolatile memory cell employing a plurality of dielectric nanoclusters and a method of fabricating the same are disclosed. In one embodiment, the nonvolatile memory cell comprises a semiconductor substrate having a channel region. A control gate is disposed above the channel region. A control gate dielectric layer is disposed between the channel region and the control gate. A plurality of dielectric nanoclusters are disposed between the channel region and the control gate dielectric layer. Each nanocluster may be separated from adjacent nanoclusters by the control gate dielectric layer. A tunnel oxide layer is disposed between the plurality of dielectric nanoclusters and the channel region. Further, a source and a drain are formed in the semiconductor substrate.
申请公布号 US2005067651(A1) 申请公布日期 2005.03.31
申请号 US20040944382 申请日期 2004.09.16
申请人 KIM KI-CHUL;LIM BYOU-REE;KIM SANG-SU;LEE BYOUNG-JIN;CHO IN-WOOK 发明人 KIM KI-CHUL;LIM BYOU-REE;KIM SANG-SU;LEE BYOUNG-JIN;CHO IN-WOOK
分类号 H01L27/115;H01L21/28;H01L21/336;H01L29/423;H01L29/51;H01L29/792;(IPC1-7):H01L29/76 主分类号 H01L27/115
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