发明名称 |
Interferometer endpoint monitoring device |
摘要 |
A photomask etch chamber, which includes a substrate support member disposed inside the chamber. The substrate support member is configured to support a photomask substrate. The chamber further includes a ceiling disposed on the chamber and an endpoint detection system configured to detect a peripheral region of the photomask substrate.
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申请公布号 |
US2005067103(A1) |
申请公布日期 |
2005.03.31 |
申请号 |
US20030672420 |
申请日期 |
2003.09.26 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
NGUYEN KHIEM K.;SATITPUNWAYCHA PETER;MAK ALFRED W. |
分类号 |
C23F1/00;G03F1/08;H01J37/32;(IPC1-7):C23F1/00 |
主分类号 |
C23F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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