FILM-FORMING APPARATUS AND FILM-FORMING METHOD

摘要

Disclosed is a film-forming apparatus (10) which comprises a plasma generation chamber (14) for producing a plasma wherein the pressure is increased by a process gas, a film formation chamber (20) wherein a substrate is contained and a film is formed on the substrate, and a separation plate (17) for separating the plasma generation chamber (14) and the film formation chamber (20) which plate has a plurality of holes. The holes of the separation plate (17) are formed to have a diameter such that the pressure in the plasma generation chamber (14) is 2.0 or more times higher than the pressure in the film formation chamber (20). The film-forming apparatus (10) further comprises a means for applying a certain bias voltage between the plasma generation chamber (14) and the film formation chamber (20).