INSTRUMENT AND METHOD FOR MEASURING POSITION OF WAFER, RETICLE, AND LIGHT SHIELDING FILTER

摘要

PROBLEM TO BE SOLVED: To improve the focal-point deciding accuracy of an exposure device which exposes a resist-applied wafer to light, and to reduce the manufacturing cost and running cost of the device.

SOLUTION: The aligner is provided with: a light shielding filter 1 which only passes light having a wavelength which does not expose a resist to light by shielding light having a wavelength which exposes the resist to light, when exposing light A containing two types of the light having the different wavelengths are made incident; a projection lens 3 which emits the light having the wavelength which does not expose the resist to light and passed through the filter 1 upon a wafer 6, so that the wafer 6 reflects the light when the light is made incident to the lens 3; and a sensor 4 which senses the light emitted from the lens 3 to the wafer 6 and reflected by the wafer 6 when the light is made incident to the sensor 4. The aligner is also provided with a measuring section 15 which measures the vertical position of the wafer 6 by using the sensed result of the light sensed by the sensor 4.

COPYRIGHT: (C)2005,JPO&NCIPI