发明名称 FUNCTIONAL SUBSTRATE MANUFACTURING DEVICE AND FUNCTIONAL SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a functional substrate manufacturing device finely precisely forming a dot pattern by a solution containing a functional material and having high quality, and to provide a high quality functional substrate manufactured by the manufacturing device, in which the fine precise dot pattern is formed. SOLUTION: The functional substrate manufacturing device jets the solution containing the functional material to a desirable position of the substrate 14 based on solution giving information inputted by an information input means. A jetting head 11 and a laser beam irradiation means 23 are mounted on a carriage 12, the solution is given to the substrate 14 by the laser beam irradiation means 23 copying to a track formed by irradiating a laser beam, the laser beam irradiation means 23 and the jetting head 11 are separated with a space 26, and fit to a holding means so that the space 26 is made larger than the distance between the substrate 14 and the exhaust port surface of the jetting head 11. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005085474(A) 申请公布日期 2005.03.31
申请号 JP20030312553 申请日期 2003.09.04
申请人 RICOH CO LTD 发明人 SEKIYA TAKURO
分类号 H05B33/10;H01L51/50;H05B33/14;(IPC1-7):H05B33/10 主分类号 H05B33/10
代理机构 代理人
主权项
地址