| 摘要 |
1,133,936. Ion beam tubes. ION PHYSICS CORP. 15 June, 1966 [16 June, 1965], No. 26790/66. Heading H1D. [Also in Division C7] A tenacious deposit of a solid material is formed on a substrate 18, e.g. of glass, metal or polymerized ethylene terephthalate, by directing an inert gas ion or atom beam under a vacuum of less than 10<SP>-5</SP> Torr e.g. in a vacuum chamber 10, 26 at a target 14 of the solid material at an energy e.g. 5-50 KEV sufficient to remove particles therefrom, and placing the substrate e.g. on a support 19 in the path of the removed particles. As shown an ion beam from a duoplasmatron source 24, wherein inert gas is fed through a capillary A to a heated cathode 27 surrounded by a solenoid 29 and intermediate electrode 28, may be neutralized e.g. by a heated Ta filament 37 to form atoms which strike the target. The inert gas may be argon, xenon or krypton. The target material may be a metallic or non-metallic element or its oxide, a ceramic, dielectric, semi-conductor or glass, e.g. C, Si, Al, SiC, Ti, SiO 2 , TiO 2 , Ta, W. A capacitor may be formed by applying a SiO 2 film to a metal base followed by a metal film.
|
