发明名称 FABRICATION OF CONDUCTIVE METAL LAYER ON SEMICONDUCTOR DEVICES
摘要 <p>A method for fabrication of a light emitting device on a substrate, the light emitting device having a wafer with multiple epitaxial layers and an ohmic contact layer on the epitaxial layers remote from the substrate. The method includes the steps:(a) applying to the ohmic contact layer a seed layer of a thermally conductive metal;(b) electroplating a relatively thick layer of the conductive metal on the seed layer; and(c) removing the substrate.A corresponding light emitting device is also disclosed. The light emitting device is a GaN light emitting diode or laser diode.</p>
申请公布号 WO2005029572(A1) 申请公布日期 2005.03.31
申请号 WO2003SG00222 申请日期 2003.09.19
申请人 TINGGI TECHNOLOGIES PRIVATE LIMITED;KANG, XUEJUN;WU, DAIKE;PERRY, EDWARD ROBERT 发明人 KANG, XUEJUN;WU, DAIKE;PERRY, EDWARD ROBERT
分类号 H01L21/285;H01L21/4763;H01L23/36;H01L23/367;H01L23/373;H01L31/024;H01L31/052;H01L31/18;H01L33/06;H01L33/32;H01L33/40;H01L33/44;H01S5/02;H01S5/024;H01S5/042;H01S5/323;(IPC1-7):H01L21/476 主分类号 H01L21/285
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