THERMAL PROCESSING APPARATUS AND THERMAL PROCESSING METHOD

摘要

A thermal processing apparatus is provided to easily control the intensity of irradiation of light by having a light source composed of a plurality of flash lamps. A substrate is heated by irradiating flash light to the substrate. A light source(5) has a plurality of flash lamps(69). An assistant heating unit preheats the substrate. A maintenance element maintains the substrate, including the light source and the maintenance element. A control element(10) controls the interval of irradiation between the maintenance element and the light source when the light source irradiates the flash light.