发明名称 Imaging device and manufacturing method thereof
摘要 Disclosed is an imaging device including a photodiode and floating diffusion region formed to be spaced from each other on a surface layer of a pixel region of a silicon (semiconductor) substrate, and a transfer gate having one of a concave and convex portions toward the floating diffusion region, the transfer gate being formed above the silicon substrate between the photodiode and the floating diffusion region by interposing a gate insulating film therebetween.
申请公布号 US2005067640(A1) 申请公布日期 2005.03.31
申请号 US20040866829 申请日期 2004.06.15
申请人 FUJITSU LIMITED 发明人 OHKAWA NARUMI
分类号 H01L27/146;H01L27/148;H04N5/335;H04N5/357;H04N5/369;H04N5/374;H04N5/376;(IPC1-7):H01L27/148 主分类号 H01L27/146
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