| 摘要 |
THE DISCLOSED PROCESS FOR REJUVENATION TREATMENT OF A PHOTORESIST DEVELOPMENT WASTE MAINLY CONTAINING A PHOTORESIST AND TETRAALKYLAMMONIUM (TAA) IONS COMPRISES AT LEAST THE STEP OF CONCENTRATION OF TAA IONS BY ELECTRODIALYSIS AND/OR ELECTROLYSIS, AND/OR AND THE STEP OF REMOVAL OF IMPURITIES [(RESIDUAL) PHOTORESIST, OTHER INIONIC COMPONENTS, CATIONIC COMPONENTS SUCH AS NA+, ETC.] BY ADSORPTION THEREOF ON AN ION EXCHANGE RESIN (PREFERABLY AN ANION EXCHANGE RESIN AND/OR A CATION EXCHANGE RESIN IN AT LEAST ONE OF THE HYDROGEN ION FORM AND THE TAA ION FORM) THROUGH CONTACT THEREBETWEEN, WHEREBY A HIGH-PURITY SOLUTION OF A TETRAALKYLAMMONIUM HYDROXIDE REUTILIZABLE AS A PHOTORESIST DEVELOPER CAN BE SIMPLY AND EFFICIENTLY REGENERATED AND RECOVERED FROM THE PHOTORESIST DEVELOPMENT WASTE. THE STEP OF CONCENTRATION BY EVAPORATION AND/OR REVERSE OSMOSIS MEMBRANE TREATMENT MAY DESIRABLY BE TAKEN AT LEAST BEFORE ELECTRODIALYSIS AND/OR ELECTROLYSIS FROM THE STANDPOINT OF TREATMENT COST REDUCTION.FIGURE 1
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