发明名称 DISPLAY
摘要 <p><P>PROBLEM TO BE SOLVED: To suppress uneven exposure of a photosensitized material caused by differences in wavelengths of a plurality of beams for exposing the photosensitized material, as to a device and method for light quantity adjustment. <P>SOLUTION: An optical filter 40 is prepared which is an optical filter with a transmission characteristic determined so that a prescribed constant output value is outputted from a light receiving part 20 when a beam is received through an optical filter by the receiving part 20, the beam satisfying a relation between a light quantity and a wavelength, and the relation equalizing the exposure level of the photosensitized material 1 to a predetermined prescribed constant exposure level. Respective laser beams emitted from respective laser beam irradiation parts 10A, 10B, ... are severally received through the optical filter 40 by the receiving part 20. The light quantity of each of the laser beams emitted from the irradiation parts 10A, 10B, ... is adjusted so that the output values of the laser beams outputted from the receiving part 20 equal the prescribed constant output value. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p>
申请公布号 JP2005083872(A) 申请公布日期 2005.03.31
申请号 JP20030315711 申请日期 2003.09.08
申请人 FUJI PHOTO FILM CO LTD 发明人 SHIMIZU ATSUKO;SUMI KATSUTO
分类号 B41J2/44;B41J2/45;B41J2/455;G01J1/02;G01J1/04;G01J1/42;G03F7/20;H01S5/0683;(IPC1-7):G01J1/02;H01S5/068 主分类号 B41J2/44
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