| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method for manufacturing an electrooptical device for rapidly forming a capacitor section of the electrooptical device with uniform impurities. <P>SOLUTION: In the method for manufacturing the capacitor section of the electrooptical device, a polysilicon film to constitute the electrode of the capacitor section of the electrooptical device is deposited in a polycrystalline state. More particularly, the deposition of the polysilicon film is performed by single-wafer processing. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
