HEAT DEVELOPABLE PHOTOSENSITIVE MATERIAL AND METHOD FOR MANUFACTURING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a heat developable photosensitive material less liable to scuffing during or immediately after heat development. SOLUTION: The heat developable photosensitive material has on a support at least one photosensitive layer containing a photosensitive silver halide, a non-photosensitive organic silver salt, a silver ion reducing agent and a binder, colloidal silica having an alkali component content of≤1 ppm is contained in the photosensitive layer or a non-photosensitive layer. COPYRIGHT: (C)2005,JPO&NCIPI