Light projection system for use during manufacture of semiconductor elements on substrate has lamp shining light through slit onto mask or reticle scanned in front of lens

摘要

The light projection system (100) has a lamp (15) shining light through a slit (18) onto a mask or reticle (6) scanned sideways (45) in front of a lens (51). The mask incorporates transparent (10') or semitransparent (12') elements. The mask elements are arranged in an array designed to give a regular pattern (10'',12'') when focused on a substrate (17). The lens may be adjusted to focus or defocus the image to a given extent to vary the pattern. The substrate may be scanned sideways (46) under the lens.