| 摘要 |
<P>PROBLEM TO BE SOLVED: To ensure excellence in roughness, etching resistance, sensitivity and resolution and to accurately and stably form a fine pattern. <P>SOLUTION: The radiation-sensitive resin composition contains a polymer having an onium salt structural unit represented by formula (1) and/or formula (2) as a repeating unit, wherein R<SP>1</SP>represents H, halogen, cyano, a 1-5C linear or branched alkyl or haloalkyl; R<SP>2</SP>and R<SP>3</SP>each independently represent a substituted or unsubstituted 1-10C linear or branched alkyl, alkoxy or haloalkyl or a 6-20C aryl; A<SP>1</SP>represents a single bond, an ether bond, an ester bond or an amido bond; and X<SP>-</SP>represents an anion. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
