发明名称 METHOD AND APPARATUS FOR MEASURING DISTORTION, AND PROJECTIVE EXPOSURE SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide a method for measuring distortion values, without the need for controlling coordinates so precisely. SOLUTION: A plurality of point sources (Pa, Pb) are arranged in a prescribed positional relation on a object plane (o) of an optical system to be measured (1). Then, the arrangement positions of the plurality of point sources (Pa, Pb) are moved on the object plane (o), while the positional relation is maintained, and changes in the positional relation of a plurality of point images (Ia, Ib) are detected, which are formed on an image plane (i) of the optical system to be measured (1) and which move along with motions, and the distortion values of the optical system to be measured are calculated, based on the changes. Thus, by maintaining the positional relation of the plurality of point sources (Pa, Pb), the distortion values are obtained with high precision, even when the coordinates are not controlled so precisely. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005083869(A) 申请公布日期 2005.03.31
申请号 JP20030315687 申请日期 2003.09.08
申请人 NIKON CORP 发明人 YANAGI SHIKIYO
分类号 G01M11/02;G03F7/20;H01L21/027;(IPC1-7):G01M11/02 主分类号 G01M11/02
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