发明名称 MOSFET structures with conductive niobium oxide gates
摘要 MOSFET gate structures are provided comprising a niobium monoxide gate, overlying a gate dielectric. The niobium monoxide gate may have a low work function suitable for use as an NMOS gate.
申请公布号 US2005067664(A1) 申请公布日期 2005.03.31
申请号 US20030677006 申请日期 2003.09.30
申请人 GAO WEI;ONO YOSHI 发明人 GAO WEI;ONO YOSHI
分类号 H01L21/28;H01L21/285;H01L21/336;H01L29/423;H01L29/49;H01L29/51;H01L29/76;H01L29/78;(IPC1-7):H01L29/76 主分类号 H01L21/28
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