发明名称 Target manipulation for pulsed laser deposition
摘要 In a method and apparatus for pulsed laser deposition, a target is eroded more uniformly by employing a two-stage laser scanning process. In a first stage, a pulsed laser strikes the target along an x/y scan pattern across the surface of the target while the target is rotationally fixed. In a second stage, the target is rotated by an incremental angle. These two stages are continuously repeated in sequence throughout the pulsed laser deposition process.
申请公布号 US2005067389(A1) 申请公布日期 2005.03.31
申请号 US20030670765 申请日期 2003.09.25
申请人 GREER JAMES A.;HOWARD BRENDAN;PARADISE MICHAEL;IVNITSKIY SERGEY N.;LATIONS DAVID 发明人 GREER JAMES A.;HOWARD BRENDAN;PARADISE MICHAEL;IVNITSKIY SERGEY N.;LATIONS DAVID
分类号 C23C14/28;(IPC1-7):B23K26/00 主分类号 C23C14/28
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